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Vlček, Jaroslav
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ResearcherID: B-9259-2016
Other Names: Jaroslav Vlcek
URL: http://www.researcherid.com/rid/B-9259-2016
ORCID: http://orcid.org/0000-0003-2627-2074
My Institutions (more details)
Primary Institution:
Sub-org/Dept: Faculty of Applied Sciences; Department of Physics and NTIS - European Centre of Excellence
Role:
 
 

This list contains papers that I have authored.

publication(s)  
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1.  Title: Structure and properties of Hf-O-N films prepared by high-rate reactive HiPIMS with smoothly controlled composition
 Author(s): Belosludtsev, A.; Houska, J.; Vlcek, J.; et al.
 Source: Ceramics International Volume: 43 Issue: 7 Pages: 5661-5667 Published: 2017
 Times Cited: 1
 DOI: 10.1016/j.ceramint.2017.01.102
added
02-May-17
2.  Title: A parametric model for reactive high-power impulse magnetron sputtering of films
 Author(s): Kozak, Tomas; Vlcek, Jaroslav
 Source: Journal of Physics D-Applied Physics Volume: 49 Issue: 5 Published: 2016
 Times Cited: 15
 DOI: 10.1088/0022-3727/49/5/055202
added
23-Feb-16
3.  Title: Absolute OH and O radical densities in effluent of a He/H2O micro-scaled atmospheric pressure plasma jet
 Author(s): Benedikt, J.; Schroeder, D.; Schneider, S.; et al.
 Source: Plasma Sources Science & Technology Volume: 25 Issue: 4 Published: 2016
 Times Cited: 4
 DOI: 10.1088/0963-0252/25/4/045013
added
07-Nov-16
4.  Title: Dependence of characteristics of MSiBCN (M = Ti, Zr, Hf) on the choice of metal element: Experimental and ab-initio study
 Author(s): Houska, J.; Mares, P.; Simova, V.; et al.
 Source: Thin Solid Films Volume: 616 Pages: 359-365 Published: 2016
 Times Cited: 1
 DOI: 10.1016/j.tsf.2016.08.066
added
09-Jan-17
5.  Title: High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films
 Author(s): Vicek, J.; Belosludtsev, A.; Rezek, J.; et al.
 Source: Surface & Coatings Technology Volume: 290 Pages: 58-64 Published: 2016
 Times Cited: 15
 DOI: 10.1016/j.surfcoat.2015.08.024
added
08-Jun-16
6.  Title: Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control
 Author(s): Pi, N. W.; Zhang, M. H.; Jiang, J. C.; et al.
 Source: Thin Solid Films Volume: 619 Pages: 239-249 Published: 2016
 Times Cited: 4
 DOI: 10.1016/j.tsf.2016.10.059
added
09-Jan-17
7.  Title: Superior high-temperature oxidation resistance of magnetron sputtered Hf-B-Si-C-N film
 Author(s): Zeman, P.; Zuzjakova, S.; Mares, P.; et al.
 Source: Ceramics International Volume: 42 Issue: 4 Pages: 4853-4859 Published: 2016
 Times Cited: 4
 DOI: 10.1016/j.ceramint.2015.11.171
added
08-Mar-16
8.  Title: Thermal, mechanical and electrical properties of hard B4C, BCN, ZrBC and ZrBCN ceramics
 Author(s): Houska, J.; Steidl, P.; Vlcek, J.; et al.
 Source: Ceramics International Volume: 42 Issue: 3 Pages: 4361-4369 Published: 2016
 Times Cited: 4
 DOI: 10.1016/j.ceramint.2015.11.115
added
23-Feb-16
9.  Title: Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films
 Author(s): Vlcek, J.; Rezek, J.; Houska, J.; et al.
 Source: Vacuum Volume: 114 Pages: 131-141 Published: 2015
 Times Cited: 22
 DOI: 10.1016/j.vacuum.2014.12.004
added
06-Feb-16
10.  Title: Dependence of structure and properties of hard nanocrystalline conductive films MBCN (M = Ti, Zr, Hf) on the choice of metal element
 Author(s): Houska, J.; Kohout, J.; Mares, P.; et al.
 Source: Thin Solid Films Volume: 586 Pages: 22-27 Published: 2015
 Times Cited: 1
 DOI: 10.1016/j.tsf.2015.04.023
added
06-Feb-16
publication(s)  
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